2008-01-21 EE Times Europe

Groups collaborate on EUV lithography advances

LONDON - Belgian research group IMEC (Leuven) and another leading center for next-generation nanoelectronics research and development, the College of Nanoscale Science and Engineering (CNSE) of the University at Albany in Albany, New York, will collaborate on extreme ultraviolet lithography experiments as a..

2008-01-07 Photonics Online

Emerging Lithography And Nanotechnology Highlight SPIE Advanced Lithography Program

Bellingham, WA - Micro- and nanolithography practitioners will share their up-to-the-minute research results and latest innovations at the SPIE Advanced Lithography conference in San Jose, CA, USA, in...

2007-12-03 Semiconductor International

Cymer 100 Watt EUV Source Is On Track

Cymer Inc. (San Diego, Calif.) said it has reached 100 Watts of extreme ultraviolet (EUV) pulse power, putting the company on track to create a 100-watt EUV source module in about a year for the pre-production EUV...